Tectra Plasma Sources - Provides the Tectra Plasma Source, a multi-purpose source producing either atoms or ions and finds

		Wednesday, 23 July, 2008
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Tectra Plasma Sources

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	Provides the Tectra Plasma Source, a multi-purpose source producing either atoms or ions and finds uses in a range of HV and UHV applications. Sponsored Links:
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Title:	Plasma Source as atom source, ion source and atom/ion hybrid source (microwave plasma source)
Description:	tectra's new Gen2 Plasma Source which can be user configured as Atom Source, Ion Source or Atom/Ion Hybrid Source. As filamentless ECR microwave plasma source it can be used with reactive gases, not p
Category:	Specs - Beam - Specification - Microwave - Nitrogen - Source - Oxygen - Cleaning - Atom - Molecular - Deposition - Defects - Vacuum - Plasma - Sputtering - Oxford - Hydrogen - Nitride - Assisted - Depostion - Epitaxy - Implantation - Etching - Lattice - Passivation - Downstream - Kaufman - Broad - Kaufmann - Ibad - Pre-cleaning - Passivate - Ultra-high - Kaufmann-type - Nitriding - Gaaln - 2.45ghz

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